X-Ray Photoelectron Spectroscopy for industrial applications

X - Ray Photoelectron Spectroscopy of Silicate Glasses

X-ray photoelectron spectroscopy (XPS) is a powerful technique capable of providing unique information about the structural chemistry of glasses. However, inappropriate procedures for the preparation of sample surfaces or the lack of reliable methods to overcome electrostatic charging effects during analysis of dielectric materials can cause spurious features to be introduced or intrinsic featu...

Photoelectron spectroscopy for surface analysis: X-ray and UV excitation

This article summarizes the basic principles of photoelectron spectroscopy for surface analysis, with examples of applications in material science that illustrate the capabilities of the related techniques. Handbook of instrumental techniques from CCiTUB Photoelectron spectroscopy for surface analysis 1 MT.1

Surface and core hole effects in X-ray photoelectron spectroscopy

Highly sensitive nitric oxide detection using X-ray photoelectron spectroscopy.

Nitric oxide (NO) is important physiologically as a gaseous messenger in the central nervous system;1 its level is also associated with several disease states.2 The concentration of NO in these cases is in the nanomolar range; therefore accurate and direct detection of NO at these levels is important. NO is also a decomposition product of several explosives3 so detection of trace amounts of exp...

Quantitative characterization of DNA films by X-ray photoelectron spectroscopy.

We describe the use of self-assembled films of thiolated (dT)25 single-stranded DNA (ssDNA) on gold as a model system for quantitative characterization of DNA films by X-ray photoelectron spectroscopy (XPS). We evaluate the applicability of a uniform and homogeneous overlayer-substrate model for data analysis, examine model parameters used to describe DNA films (e.g., density and electron atten...